Scanning Electron Microscopy Facilities

For enquiries about our SEM capabilities, please conact SEM section    

Zeiss Sigma VP 3view

  • Schottky field emission gun (FEG) SEM for high resolution imaging
  • Variable pressure (VP) capability enabling study of non-conductive materials
  • Equipped with Gatan 3view 2XP serial block face (SBF) SEM system, enabling fully automated serial sectioning through resin-embedded samples
  • Dedicated low kV BSE detector providing TEM quality backscatter electron images, revealing cellular strucutures in a wide range of life-science samples
  • Tomographic z-resolution <30nm using the 3view system
  • Up to 32k x 24k pixel image collection
  • The Sigma can also be fitted with a regular, motorised SEM stage for routine imaging of both bulk and electron transparent samples
  • Compatible for use with correlative microscopy system, Shuttle and Find

Zeiss Sigma VP FEG SEM






JEOL Neoscope Tabletop SEM

  • Compact tabletop SEM
  • High quality imaging (both SE and BSE) of features down to sub-micron levels
  • Equipped with tilt/rotate stage
  • Low vacuum (LV) capability for imaging non-conductive samples
  • Fast training - normally completed within 1 hour
  • Easy to use with a high throughput

Zeiss ULTRA Plus

  • Schottky field-emission source for high resolution and beam current
  • Exceptional low kV performance
  • Topgraphic imaging to < 1nm using an in-lens secondary electron detector
  • High-resolution orientation and strain imaging by AsB detector
  • Nanoscale, high-sensitivity compositional imaging using EsB detector and limiting grid
  • Charge compensator (gas injector) for imaging of non-conducting specimens
  • Oxford Instruments AZtec integrated EDS and EBSD system, with X-Max 20mm2 silicon drift EDS detector and Nordlys-nano EBSD detector, equipped with forescatter imaging capability
  • Dedicated sample holders for transmission Kikuchi diffraction (TKD) analyses
  • Oxford Instruments Layerprobe software for measuring thin film thicknesses and composition
  • High-current mode for extended depth of field and EBSD
  • STEM detector with brightfield and darkfield imaging
  • Evactron on-chamber Plasma cleaner for removing carbon contamination.
  Zeiss ULTRA plus

Zeiss EVO

  • Zeiss EVO 50 SEM can be used for a range of imaging and analytical applications using either a W or LaB6 filament
  • Large area BSE detector ideal for imaging mineralogical and metallurgical samples
  • Oxford Instruments AZtec EDS system, with large area X-Max 80mm2 silicon drift EDS detector
  • Fully automated analytical capability with particle detection ("Feature"), large area imaging and EDS map montaging
  • Ideal for automated detection of inclusions in steel, heavy minerals in rocks and particle classification in engineering applications
  • Multi sample stages (5 polished thin sections or 9 epoxy-mounted blocks)
  Intellection Quemscan

 Zeiss Auriga FIB-SEM

  • Schottky field-emission electron source for high resolution and high stability imaging
  • Topographic imaging down to 1nm resolution
  • Additional imaging with retractable BSE and STEM detectors
  • High resolution Ga ion source (Cobra) with <2.5nm resolution
  • Additional low kV FIB option, enabling high resolution milling below 5kV
  • Multi and single gas injection systems with range of precursor gas options
  • FIBICS advanced patterning software
  • Integrated Oxford Instrument AZtec EDS and EBSD system, with X-Max 20mm2 SDD EDS detector, and high speed Nordlys-F+ EBSD detector
  • Automated 3D EDS and EBSD mapping capability
  • In-chamber Kleindiek micromanipulator system for in-situ TEM and atom probe sample lift-out



 FEI Quanta 200 3D

  • W-filament SEM with totally automated 5-axis specimen stage
  • SE and BSE imaging
  • High vacuum, low vacuum and ESEM modes enable charge-free imaging and analysis of non-conductive specimens
  • Focused Ion Beam (FIB) for subsurface characterisation of specimens and preparation of TEM sections / atom probe tips
  • Platinum gas injection system
  • In-chamber Kleindiek micromanipulator system for in-situ TEM and atom probe sample lift-out
  • Renishaw Structural and Chemical Analyser (SCA) system, interfacing the Raman inVia Reflex Microscope to the Quanta allowing secondary electron imaging and Raman spectroscopic analysis from the same region of a sample located in the SEM chamber
  • EDAX Genesis EDS system with Si(Li) detector
   FEI Quanta 200 3D