Scanning electron microscopy (SEM) facilities

Schottky field-emission monochromated electron source for high resolution and high stability imaging
Topographic imaging below 1nm resolution
Stage biasing for low voltage imaging
Wide array of detectors including, CBD, ABS and STEM.
Multiple Plasma Ion source including Xe.Ar.N and O for high throughput milling and targeted ion solid interactions
Multi gas injection and mixing systems with range of precursor gas options
Integrated Oxford Instrument AZtec EDS and EBSD system, with X-Max 80mm2 SDD EDS detector, and high speed Symmetry EBSD detector
Automated 3D imaging, EDS and EBSD mapping capability
Easy lift micro manipulator for in-situ TEM and atom probe sample lift-out

Schottky field emission gun SEM for high resolution imaging
Variable pressure capability enabling study of non-conductive material
Gatan 3view 2XP serial block face SEM system, enabling fully automated serial sectioning through resin-embedded samples
Low kV BSE detector providing TEM quality backscatter electron images, revealing cellular structures in a wide variety of life sciences samples
Tomographic z-resolution <30nm using 3view system
Up to 32k x 24k pixel image collection
This instrument can be fitted with a regular, motorised SEM stage for routine imaging of both bulk and electron transparent samples
Compatible with correlative microscopy system, Shuttle and Find

Specialist:
Dr Errin Johnson (errin johnson@sydney.edu.au) (Bio)

Schottky field emission gun (FEG) SEm for high resolution imaging
Variable pressure (VP) capability enabling study of non-conductive material
Dedicated low kV BSE detector providing TEM quality backscatter electron images, revealing cellular structures in a wide range of life-science samples
STEM detector with brightfield and darkfield imaging
Topographic imaging to ~1nm using an in-lens secondary electron detector
Up to 8k resolution image collection
Compatible for use with correlative microscopy system, Shuttle and Find
Integrated Oxford instrument AZtec EDS and EBSD system, with X-Max 20mm2 SDD EDS detector and high speed Nordlys-F+ EBSD detector

This all-in-one, superfast and easy to use desktop SEM provides high resolution imaging with elemental analysis of large samples up to 100mm x 100mm
Can be used for SE, BSE imaging and EDS analysis
Integrated EDS system with Thermoelectrically cooled Silicon Drift Detector (SDD)
A proprietary venting/loading mechanism ensures the fastest vet/load cycle
Electron Optical: long lifetime thermionic source (CeB6) and multiple beam currents
Computer controlled motorized stage
Fast training - normally completed in 1 hour
Easy to use with a high throughput

Schottky field-emission source for high resolution and beam current
Exceptional low kV performance
Topographic imaging to < 1nm using an in-lens secondary electron detector
High-resolution orientation and strain imaging by AsB detector
Nanoscale, high-sensitivity compositional imaging using EsB detector and limiting grid
Charge compensator (gas injector) for imaging of non-conducting specimens
Oxford Instruments AZtec integrated EDS and EBSD system, with X-Max 20mm2 silicon drift EDS detector and Symmetry CMOS EBSD detector, allowing 0.3ms per point acquisition
Dedicated sample holders for transmission Kikuchi diffraction (TKD) analysis
Oxford Instruments Layerprobe software for measuring thin film thicknesses and composition
High-current mode for extended depth of field and EBSD
STEM detector with brightfield and darkfield imaging
Evactron on-chamber Plasma cleaner for removing carbon contamination.

Zeiss EVO 50 SEM can be used for a range of imaging and analytical applications using either a W or LaB6 filament
Large area BSE detector ideal for imaging mineralogical and metallurgical samples
Oxford Instruments AZtec EDS system, with large area X-Max 80mm2 silicon drift EDS detector
Fully automated analytical capability with particle detection ("Feature"), large area imaging and EDS map montaging
Ideal for automated detection of inclusions in steel, heavy minerals in rocks and particle classification in engineering applications
Multi sample stages (5 polished thin sections or 9 epoxy-mounted blocks)

Schottky field-emission electron source for high resolution and high stability imaging
Topographic imaging down to 1nm resolution
Additional imaging with retractable BSE and STEM detectors
High resolution Ga ion source (Cobra) with <2.5nm resolution
Additional low kV FIB option, enabling high resolution milling below 5kV
Multi and single gas injection systems with range of precursor gas options
FIBICS advanced patterning software
In-chamber Kleindiek micromanipulator system for in-situ TEM and atom probe sample lift-out
Cryo stage and cryo UHV transfer system for cyro milling and vacuum transfer of APT samples

Scanning electron microscopy