High Power Pulsed Magnetron Sputtering

We are developing a new form of sputtering known as High Power Pulsed Magnetron Sputtering that creates ions from the sputtered material. We deliver very high amounts of energy to the plasma over short time intervals so that the atoms sputtered from the surface are stripped of electrons and become ions. We then accelerate these ions onto the growth surface where new types of material are formed during the violent impact events.

sputtering

AJA multitarget magnetron sputterer in operation.